Mold cleaning with polydimethylsiloxane (PDMS) for nanoimprint lithography
نویسندگان
چکیده
We present a simple and effective mold cleaning method for nanoimprint lithography. Polydimethylsiloxane (PDMS) prepolymer is spin-coated onto a contaminated imprint mold, thermally cured in ambient environment, and then peeled off afterwards. Contaminants of 100s m to sub-50 nm sizes are effectively cleaned within one cycle. During the cleaning process, a very thin PDMS film (1~2 nm) is uniformly coated on the mold surface, serving as a protection and anti-sticking layer.
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